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A Role for Histone H2B During Repair of UV-Induced DNA Damage in Saccharomyces cerevisiae
Emmanuelle M. D. Martinia, Scott Keeneya, and Mary Ann Osleyba Molecular Biology Program, Memorial Sloan-Kettering Cancer Center, New York, New York 10021
b Department of Molecular Genetics and Microbiology, University of New Mexico Health Sciences Center, Albuquerque, New Mexico 87131
Corresponding author: Mary Ann Osley, Cancer Research Facility, CRF 123, University of New Mexico Health Sciences Center, 915 Camino de Salud, Albuquerque, NM 87131., mosley{at}salud.unm.edu (E-mail)
Communicating editor: L. S. SYMINGTON
and rad52
mutants but not in rad6
or rad18
mutants, which are defective in postreplicational DNA repair (PRR). When combined with other mutations that affect PRR, the histone mutation increased the UV sensitivity of strains with defects in either the error-prone (rev1
) or error-free (rad30
) branches of PRR, but did not enhance the UV sensitivity of a strain with a rad5
mutation. When combined with a ubc13
mutation, which is also epistatic with rad5
, the htb1-3 mutation enhanced UV-induced cell killing. These results suggest that histone H2B acts in a novel RAD5-dependent branch of PRR.
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